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Chromic Oxide Slurry
CP titanium was polished with a colloidal sitica suspension and chromic ox{de slurry under low and high pressures. The polisheti surfaces wer'e characterized by means of EI]MA and XPS. Irrespeetive of polishing pressure, colloidal silica suspension suecessfully created a mirror-Iike surface that was clean at EPMA level, However, XPS detected a small amount of silicon on the outermost surface. O...
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ژورنال
عنوان ژورنال: The American Journal of the Medical Sciences
سال: 1914
ISSN: 0002-9629
DOI: 10.1097/00000441-191401000-00027